Иваново, Ивановская область, Россия
The research expands possible aspects of technological application of gas discharges in the technology of treatment and modification of various materials. Chemically active plasma allows intensifying conventional chemical processes at the expense of a more effective use of energy supplied to the system. By this approach all stages of the kinetic scheme of interacting particles technology in the plasma-chemical reactor become determinative. We study the processes observed at the signal switching fronts at pulse discharge power supply. Indeed, this mode of discharge combustion enables to achieve more effective utilization of reagents used in plasma chemical etching of different materials. Also we made the complex analysis of reasons causing appearance of transients at the front of signal switching in the discharge with periodical current variation. Moreover, we consider the relaxation of heavy charged and neu-tral particles in chlorine plasma.
plasma, interaction, process, transients, chlorine, silicon
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