PHYSICAL ASPECTS OF THE CHEMICALLY ACTIVE MEDIUM FORMATION IN CHLORINE PLASMA UNDER PULSE DISCHARGE ENERGIZATION
Abstract and keywords
Abstract (English):
Issledovaniya, predstavlennye v dannoy rabote, rasshiryayut vozmozhnye aspekty tehnologicheskogo ispol'zovaniya gazovyh razryadov v tehnologii obrabotki i modifikacii razlichnyh materialov. Izvestno, chto plazma na osnove himicheski aktivnyh veschestv pozvolyaet intensificirovat' tradicionnye himicheskie processy za schet bolee effektivnogo rashodovaniya energii, podvodimoy k sisteme. Pri takom podhode opredelyayuschimi stanovyatsya vse stadii tehnologii i elementy kineticheskoy shemy vzaimodeystvuyuschih chastic v plazmohimicheskom reaktore. Izucheny processy, nablyudaemye na frontah pereklyucheniya signala pri impul'snom pitanii razryada. Takoy rezhim goreniya razryada pozvolyaet dobit'sya bolee effektivnogo ispol'zovaniya reagentov, primenyaemyh pri plazmohimicheskom travlenii razlichnyh materialov. Takzhe vypolnen obobschennyy analiz prichin, privodyaschih k poyavleniyu perehodnyh processov na frontah pereklyucheniya signala v razryade s periodicheskim izmeneniem toka. Rassmotreny voprosy relaksacii tyazhelyh zaryazhennyh i neytral'nyh chastic v plazme hlora.

Keywords:
plazma, vzaimodeystvie, process, perehodnye processy, hlor, kremniy
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References

1. Rayzer Yu.P. Fizika gazovogo razryada. 3-e izd., dop. i pererab. Dolgoprudnyy: Izdat. dom «Intellekt», 2009. 736 s.

2. Sitanov D.V., Pivovarenok S.A. Kinetics of atomic recombination on silicon samples in chlorine plasma // Plasma Physics Reports. 2018. Vol. 44, no. 8. P. 713-722. DOI:https://doi.org/10.1134/S1063780X1808007X.

3. Luc Stafford, Joydeep Guha, Rohit Khare, Stefano Mattei, Olivier Boudreault, Boris Clain, Vincent M. Don-nelly. Experimental and modeling study of O and Cl atoms surface recombination reactions in O2 and Cl2 plasmas // Pure Appl. Chem. 2010. Vol. 82, no. 6. P. 1301–1315. DOI:https://doi.org/10.1351/PAC-CON-09-11-02.

4. Sitanov D.V., Efremov A.M., Svettsov V.I. Dissociation of chlorine molecules in a glow discharge plasma in mixtures with argon, oxygen, and nitrogen // High Energy Chemistry. 1998. Vol. 32, no. 2. P. 123-126.

5. Pivovarenok S.A., Murin D.B., Sitanov D.V. Effect of a mixture’s composition on the electrophysical parameters and emission spectra of hydrogen chloride plasma with chlorine and helium // Russian Microelectronics. 2021. Vol. 50, no. 1. P. 39-44. DOI:https://doi.org/10.1134/S1063739720060098.

6. Efremov A.M., Betelin V.B., Kwon K.Ho., Snegirev D.G. Plasma parameters and kinetics of active species in HBr + Cl2 + O2 gas mixture // ChemChemTech. 2019. Vol. 62, no. 7. P. 72-79. DOI:https://doi.org/10.6060/ivkkt.20196207.5947.

7. Sitanov D.V., Pivovarenok S.A. Visualization of defects on the semiconductor surface using a dielectric barrier discharge // Russian Microelectronics. 2018. Vol. 47, no. 1. P. 34-39. DOI:https://doi.org/10.1134/S1063739718010067.

8. Brok W.J.M., van Dijk J., Bowden M.D., van der Mullen J.J.A.M., Kroesen G.M.W. A model study of propa-gation of the first ionization wave during breakdown in a straight tube containing argon // J. Phys. D: Appl. Phys. 2003 Vol. 36. P. 1967.

9. Shishpanov A.I., Ionikh Y.Z., Meshchanov A.V., Dyatko N.A. Memory effect in the ignition of a low-pressure glow discharge in nitrogen in a long discharge tube // Plasma Physics Reports. 2014. Vol. 40, no. 6. P. 467-480. DOI:https://doi.org/10.1134/S1063780X1406005.

10. Dyatko N.A., Ionikh Y.Z., Meshchanov A.V. Estimation of plasma parameters in a pre-breakdown ionization wave at the glow discharge ignition in argon // Plasma Sources Science and Technology. 2021. Vol. 30, no. 5. 055015. DOI:https://doi.org/10.1088/1361-6595/abda9e.

11. Sitanov D.V. The role of chemical processes in the technological treatment of gallium arsenide under conditions of low-temperature non-equilibrium plasma reduced pressure in chlorine // From Chemistry Towards Technology Step-By-Step. 2021. Vol. 2, no. 4. P. 85-92. DOI:https://doi.org/10.52957/27821900_2021_04_85. URL: http://chemintech.ru/index.php/tor/2021-2-4

12. Sitanov D.V., Pivovarenok S.A., Murin D.B. The importance of taking into account the heterogeneous recombination of atoms when studying the kinetics of copper etching in chlorine plasma // High Temperature. 2022. Vol. 60, Suppl. 2. P. 146–152. DOI:https://doi.org/10.1134/S0018151X21050187.

13. Efremov A.M., Svettsov V.I., Sitanov D.V. The parameters of plasma and the kinetics of generation and loss of active particles under conditions of discharge in chlorine // High Temperature. 2008. Vol. 46, no. 1. P. 11 18. DOI:https://doi.org/10.1134/s10740-008-1003-4.

14. Starodubcev M.V., Kraft K. Laboratornoe modelirovanie vzaimodeystviya nestacionarnyh elektronnyh puchkov s magnitoaktivnoy plazmoy // Izvestiya vuzov. Radiofizika. 2012. T. LV. № 10–11. S. 683-697.

15. Bogdanov E.A., Kudryavtsev A.A., Tsendin L.D. Evolution of the density profiles and flows of charged particles during the diffusive decay of an electronegative gas plasma // Technical Physics. 2001. Vol. 46, no. 4. P. 404 410. DOI:https://doi.org/10.1134/1.1365462.

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