LDR 00633naa#a2200169#i#450#
001     EN\\bibl\82517
005     20250103031032.5
011 ## _a2782-1900
100 ## _a20211223b2021####ek#y0engy0150####ca
102 ## _aRU
200 1# _aThe role of chemical processes in the technological treatment of gallium arsenide under conditions of low-temperature non-equilibrium plasma reduced pressure in chlorine
       _eJournal article
210 1# _aYaroslavl
       _cYaroslavl State Technical University
       _d2021
215 ## _a8 с.
608 ## _aJournal article
       _2local
675 ## _aсредняя. 66-914.5
       _z
700 #1 _aSitanov
       _gDmitry Vyacheslavovich
856 4# _achemintech.ru
       _u