From Chemistry Towards Technology Step-By-Step From Chemistry Towards Technology Step-By-Step От химии к технологии шаг за шагом 2782-1900 81567 10.52957/27821900_2023_01_124 Научные статьи Scientific articles Научные статьи Physical aspects of the chemically active medium formation in chlorine plasma under pulse discharge energization Physical aspects of the chemically active medium formation in chlorine plasma under pulse discharge energization Ситанов Дмитрий Вячеславович Sitanov Dmitry Vyacheslavovich

кандидат химических наук;

candidate of chemical sciences;

 Ивановский государственный химико-технологический университет Ivanovo State University of Chemistry and Technology 23 03 2023 23 03 2023 4 1 124 135 20 02 2023 22 03 2023 https://chemintech.ru/en/nauka/article/81567/view

The research expands possible aspects of technological application of gas discharges in the technology of treatment and modification of various materials. Chemically active plasma allows intensifying conventional chemical processes at the expense of a more effective use of energy supplied to the system. By this approach all stages of the kinetic scheme of interacting particles technology in the plasma-chemical reactor become determinative. We study the processes observed at the signal switching fronts at pulse discharge power supply. Indeed, this mode of discharge combustion enables to achieve more effective utilization of reagents used in plasma chemical etching of different materials. Also we made the complex analysis of reasons causing appearance of transients at the front of signal switching in the discharge with periodical current variation. Moreover, we consider the relaxation of heavy charged and neu-tral particles in chlorine plasma.

The research expands possible aspects of technological application of gas discharges in the technology of treatment and modification of various materials. Chemically active plasma allows intensifying conventional chemical processes at the expense of a more effective use of energy supplied to the system. By this approach all stages of the kinetic scheme of interacting particles technology in the plasma-chemical reactor become determinative. We study the processes observed at the signal switching fronts at pulse discharge power supply. Indeed, this mode of discharge combustion enables to achieve more effective utilization of reagents used in plasma chemical etching of different materials. Also we made the complex analysis of reasons causing appearance of transients at the front of signal switching in the discharge with periodical current variation. Moreover, we consider the relaxation of heavy charged and neu-tral particles in chlorine plasma.

 plasma interaction process transients chlorine silicon

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